This monocrystal silicon wafer comes with a thermally grown oxide film and single-side polishing treatment. The surface is ultra-clean with minimal defects. Available in multiple sizes from 2 inches up to 12 inches, these wafers serve as high-quality substrates for thin-film deposition, chip prototype manufacturing and microelectronics research. They are widely adopted for university STEM teaching, material science projects and semiconductor laboratory research.

Monocrystalline silicon base with thermal oxide layer, clean surface

Single-side polished finish, ideal for semiconductor device fabrication

Sizes ranging from 2 inch to 12 inch to meet different experimental needs

Low defect density, suitable for thin film growth and material research

Perfect substrate for university STEM teaching and scientific experiments